NEWS

4Wave Introduces Small Form Factor Receive Optical Sub-Assembly (ROSA) for use in 10GBASE-LX4 Transceivers

Sterling, Virginia – February 28, 2006  4Wave today announced the introduction of its small form factor receive optical sub-assembly (ROSA) for use in the 10GBASE-LX4 transceiver, based on the IEEE 802.3ae standard, which will enable transmission of 10 Gbps Ethernet (10GbE) over 300 meters of FDDI (Fiber Distributed Data Interface)-grade MMF (multi-mode fiber). Today this fiber accounts for more than 70% of the worldwide installed fiber.

“Low cost and availability of upgrading the desktop device from 100Mbit/sec to 1000Mbit/sec (1Gbps) requires IT managers to implement 10GbE links to carry the traffic within intra-building enterprise backbone networks” says Sami Antrazi, President of 4Wave. “Our Quad LX4 ROSA enables the transceiver manufacturer to offer a robust, elegant 10GbE solution for installed multi-mode fiber installations.”

4Wave’s product, the Quad LX4 ROSA, is designed for use in the X2/XPACK transceiver modules. At the heart of the Quad LX4 ROSA is 4Wave’s patented multi-filter chip, a 4 channel CWDM optical component consisting of 4 optical filters deposited on a single piece of fused silica, used to demultiplex the 10Gbps data into 4 separate 2.5 Gbps channels. Each channel is fitted with its own high-speed photo detector and transimpedance amplifier.

“The uni-constructed multi-filter chip eliminates the need for labor intensive packaging, while reducing the package size and eliminating fiber management inside the transceiver,” said Trey Middleton, vice president of business development for 4Wave. “The streamlined packaging of the ROSA, enabled by the multi-filter chip, results in manufacturing costs consistent with market demands.”

About 4Wave, Inc.

4Wave, a member of the LX4 Trade Group, is the premier developer of atomic layer engineering techniques through ion beam processing innovations used to manufacture a wide array of miniature optical components. 4Wave’s expertise in ion beam and plasma processing systems, ion/electron/plasma sources, and in-situ process monitors for the etching and deposition of thin films has resulted in the development of the Biased Target Deposition (BTD) technique. BTD is uniquely suited to demanding nanotechnology advancements in optical, semiconductor and magnetic device industries. (www.4waveinc.com)

Company Contact:
Trey Middleton, VP Business Development
703.787.9283x100
tmiddleton@4waveinc.com

Investor Information:
Sami Antrazi, President
703.787.9283x108
santrazi@4waveinc.com