CUTTING EDGE PRODUCTS
Deposition System
Etch System
Specialty System
Mini (De) Mux Chip
4 Channel ROSA
Optical Monitors
ONE-STOP SERVICES
Optical Thin Film Coatings
Thin Film Coatings
Design & Prototyping
System Refurbishment
Engineering
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INNOVATIVE R&D
Biased Target Deposition
In-situ Process Monitoring
Dynamic Process Compensation
Ion Beam Deposition
Ion Beam Etch
Direct IBD
Ion-Assisted Evaporation

 

DEPOSITION SYSTEMS

We provide a variety of systems for the deposition of dielectric, optical, metallic, magnetic, alloy, superconducting and semiconducting thin-films using both Ion Beam Sputtering and Biased Target Sputtering in R&D, pilot production and 24/7 manufacturing system configurations.

LANS 

The LANS Laboratory Alloy and Nanolayer Sputtering system addresses the needs of researchers in demanding, cross-disciplinary dielectric, metallic, magnetic, superconducting and semiconducting thin-film development. More...

Batch Sputtering Systems

Our Batch Deposition systems address the needs of customers seeking a flexible, cost-effective, small footprint workhorse for general-purpose research and small-scale production applications using either Biased Target or conventional Ion Beam Deposition technologies. More...

Cluster Module Sputtering Systems

Our robotically loaded deposition modules address the needs of customers seeking flexible, initial production applications to complete 24/7 production requirements-using either Biased Target or conventional Ion Beam Deposition Technologies. More...

 

Load Lock Optical Coating Systems

Our Load Locked Ion Beam Sputtering and Biased Target Sputtering System address the needs of customers seeking dense stable films with low absorption and surface roughness. The systems are fully automated for 24/7 production. More... 

Batch Optical Coating System

Our Biased Target Sputtering System uses the conventional "Sputter Up" configuration with three platens in a planetary configuration. This system can process a multitude of different size parts. More... 

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