4waveInc. Ion Beam Milling and Reactive Ion Etching Systems.

	CUTTING EDGE PRODUCTS
	Deposition System
	Etch System
	Mini (De) Mux Chip
	4 Channel ROSA
	Laser End Point Detectors
	Optical Monitors

	ONE-STOP SERVICES
	Engineering
	Design & Prototyping
	Plasma Source Refurbishment
	System Refurbishment
	Thin Film Processing

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	INNOVATIVE R&D
	Biased Target Deposition
	In-situ Process Monitoring
	Dynamic Process Compensation
	Ion Beam Deposition
	Ion Beam Etch
	Direct IBD
	Ion-Assisted Evaporation

RESEARCH AND DEVELOPMENT ETCH SYSTEMS

The LIBE, LISE and LIME family of ion etching systems addresses the needs of customers seeking a flexible, cost-effective, small -footprint, ion-etching/ion-processing workhorse for general-purpose research and small-scale production applications. The LIBE, LISE and LIME products are based on a common vacuum platform with a choice of 2 different ion sources.

Ion Beam Milling System

Applications:

Ion Milling
Ion Cleaning
Plasma Ashing
Plasma Oxidation / Nitridation
Surface Modification
Reactive Etching
Biomedical

Features:

RF or DC Ion Source
High output, low-energy plasma source
150 mm diameter process surface
<5% non-uniformity
Water cooled, tilting, rotating, pulsed DC biased stage
Simple operation, small footprint

Please contact us for more information on the LIBE, LISE and LIME products. We are happy to discuss with you the configuration that best suits your application.