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OPTICAL MONITORS

Our optical thickness monitors operate on substrates on rotating workholders, ensuring accurate and repeatable measurements of thin films during deposition

Our optical thickness monitors use a single wavelength transmission or reflection method as well as sophisticated data modeling and filter techniques to determine the thickness of a deposited film.

The IL540 can be equipped with either a white light source and an automated monochromator, or with a narrow band IR laser for DWDM applications. All DWDM optical monitors come with a detector module, industrial computer, color monitor, keyboard, mouse, and control software. The IL540 also provides for data capture on rapidly rotating substrates.

White Light Optical Monitoring System, Optical Thin Film Coatings

  Specifications | System Layout

Design Features

With a white light source, the IL540 is suitable for a variety of box coaters and smaller vacuum chambers. Layer thicknesses are automatically terminated and the instrument can deal with complex multilayer structures. The standard wavelength range is 350 to 800 nm. The typical mechanical arrangement is for reflectance, but the source can be moved to a third port to provide transmitted light. Layer thickness termination accuracy is under 1 percent of the wavelength in use.

With an IR laser source centered on 1550 nm, the IL540 is the unsurpassed solution for accurate, in-process measurement of film thickness during the production of DWDM optical filters. It measures filters with passbands as narrow as 25 GHz. The following design features make this possible:

How It Works

The IL540 operates on the principle of interference between light that is reflected/transmitted at multiple interfaces in a thin film multilayer. If light of a single wavelength is reflected off (or transmitted through) a substrate with an overlying coating of thin transparent film that has a thickness of the same order of magnitude as the wavelength of light, then the detected signal shows an oscillatory behavior, which is periodic with the thickness of the thin film. The periodic nature of this signal is due to the phenomenon of interference. At one point, the waves reflected from the film/substrate and ambient/film interface will be in step with one another and interfere constructively. At a different thickness, they will be completely out of step and a null signal will result.

The difference in distance that the light has to travel between the constructive and destructive case is half a wavelength. Since the optical beam passes through the coating twice, the distance on the trace from maximum to minimum is traditionally referred to as a quarter wave thickness.

The performance of an optical coating depends on the phenomenon of interference within a simple single layer or a complex multiple component system of thin films. The crucial parameter for each film is how long the light will take to go through it, given by nx/c where n=refractive index, x=physical film thickness, and c=speed of light within a vaccuum. The form of this equation prompted the term optical thickness for its numerator, nx, and it is the measurement and control over this parameter that is crucial to a coating's performance.

The crucial measurement of optical thickness depends on refractive index as much as it does on physical thickness. Experienced coating engineers will recognize that while small changes in deposition conditions can have a significant effect on the film's physical properties, such as density, they can have quite an enormous effect on refractive index. If you are aiming for high specification films, it is simply not enough to assume that "n" is constant — you have to monitor optical thickness with an optical technique.

Benefits

The key to successful thin film optical monitoring is to design hardware that is immune to noise and interference, and to couple it with software that can handle complicated multilayer designs and accurately predict end points in accordance with the goals of the filter design. The IL540 is the most refined, robust and successful solution available to the problem of accurate endpointing in complex multilayers.

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