4Wave offers dielectric thin films using both
Ion Beam and Biased Target deposition techniques.
4Wave can provide custom optical interference
filters coatings over the spectral range of 200nm
to 2000nm for the use in a variety of
applications.
Process Equipment :
Load Lock Ion Beam Deposition
System up to 150mm wafers (Metal or Dielectric
Films)
Load Lock Biased Target
Despoition System up to 150mm wafers
(Dielectric, metal, co-deposition of up
to 2 targets mixed with oxygen)
Load Locked Biased Target
Deposition System up to 200mm wafers.
(Dielectric Films, Optical filters)
Batch Biased Target Deposition
System up to 100mm wafers. (Dielectric, metal,
co-deposition of up to 3 targets mixed with
oxygen)
Batch Biased Target Deposition
System up to 150mm wafers. (Dielectric, metal,
co-deposition of up to 2 targets mixed with
oxygen)
Metrology
Equipment:
PerkinElmer Lanbda 950 UV/VIS
Spectrometer (Transmition and Reflection)
Tencor P12 Profilometer and Stress
Measurement
Sentech SE850 UV/VIS Mapping
Elipsometer
Prometrix Resistivity Mapper
Macbeth TD929 Densitometer
Olympus BX60M Microscope with
Digital Camera
Agilent 86100A Wide Bandwidth
Osciloscope with 86105A 1000nm-1600nm
Agilent 86130A Error Perfromance
Analyser
Agilent 86142B Optical Spectrum
Analyser
Agilent 8164B Lighwave Measurement
System with
81633A Power Sensor
81600B Tunable Laser
Nettest Tunable Lasers (1300nm
+/-50nm and 1550nm +/-50nm)
TCR Measurement Station
Optical
Filters:
CWDM Filter
Near UV Long Pass Filter
Near UV Short Pass Filter
AR Coatings
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