| ENGINEERING SERVICES
PROCESS ENGINEERING
We help diagnose process irregularities, design process
experiments, evaluate the structural and chemical properties of thin films, and develop
custom process solutions. We have extensive experience in ion beam deposition, direct ion
beam deposition (PECVD), sputter deposition, ion beam etch, and reactive ion beam etch
applications. We provide the following process development services:
- Dielectric
films by reactive sputtering: fully dense,
amorphous, stable materials such as SiO2, TiO2,
Ta2O5, Al2O3
- Carbon
films: diamond like carbon, amorphous carbon,
hard and soft carbon films
- Metals:
metallization for MEMs, MMICs, semiconductors,
magnetic devices, optical components
- Magnetic
materials: magnetoresistive thin films (GMR,
spin valves, AMR), magnetic thin films
(soft/hard magnetic materials)
- Specialty
materials: ITO, YBCO, TBCCO
- Ion beam
etch for refractory materials, device definition
and trim, waveguide definition and other
applications
- Optical
interference stacks, including design
- Ion beam
PE-CVD deposition of thick SiO2 for waveguide
(sputter doped)
- In-situ
process and wafer sensors for end-point
detection and process control
- Device,
lithography and process interaction and
optimization
- Thermal management, particle control, ESD specialists
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