4Wave Z-Flex System
The Z-Flex system combines the best of Ion Beam Etching and Ion Beam Sputtering. This high value combination allows the customer to create thin film structures in common vacuum – A significant value proposition compared to the competition.
4Wave Ion Beam Sputtering Cluster Tool
The 4Wave ion beam sputtering cluster tool has maintained 4Wave’s 95% market share in the Vanadium Oxide Processing community (MEMS Market).
4Wave Laboratory Alloy and Nanolayer System (LANS)
The LANS is 4Wave’s Flagship R&D system. This system has received wide acceptance in the academic materials research world. Equipped with multiple processing targets, it is a very versatile platform for multilayer material synthesis and compositional nanotechnology.
4Wave Planetary Etch System (PSIBE)
The 4Wave Planetary system expands the 4Wave LL Etch system to include 3 processing stages for high throughput.
4Wave Load Lock Etch System
The 4Wave LL Etch System is a Flagship product addressing several significant markets. This system boasts high performance etching, critical thin film profile milling, glancing angle milling, etc.