Product Description
The Z-Flex system combines the best of Ion Beam Etching and Ion Beam Sputtering. This high value combination allows the customer to create thin film structures in common vacuum – A significant value proposition compared to the competition.
Markets Include:
- Data Storage
- Thin Film Magnetics
- Semiconductor
- Reactive Ion Assisted Etching
- Etching and overcoat processing
Applications:
- Disk Slider fabrication
- TMR and GMR applications
- Semiconductor Failure Analysis
- FINFET and advanced memory development