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Wafer

4Wave offers dielectric thin films using both Ion Beam and Biased Target deposition techniques. 4Wave can provide custom optical interference filters coatings over the spectral range of 200nm to 2000nm for the use in a variety of applications.

Process Equipment

  • Load Lock Ion Beam Deposition System up to 150mm wafers (Metal or Dielectric Films)
  • Load Lock Biased Target Despoition System up to 150mm wafers (Dielectric, metal, co-deposition of up to 2 targets mixed with oxygen)
  • Load Locked Biased Target Deposition System up to 200mm wafers. (Dielectric Films, Optical filters)
  • Batch Biased Target Deposition System up to 100mm wafers. (Dielectric, metal, co-deposition of up to 3 targets mixed with oxygen)
  • Batch Biased Target Deposition System up to 150mm wafers. (Dielectric, metal, co-deposition of up to 2 targets mixed with oxygen)

Metrology Equipment

  • PerkinElmer Lanbda 950 UV/VIS Spectrometer (Transmition and Reflection)
  • Tencor P12 Profilometer and Stress Measurement
  • Sentech SE850 UV/VIS Mapping Elipsometer
  • Prometrix  Resistivity Mapper
  • Macbeth TD929 Densitometer
  • Olympus BX60M Microscope with Digital Camera
  • Agilent 86100A Wide Bandwidth Osciloscope with 86105A 1000nm-1600nm
  • Agilent 86130A Error Perfromance Analyser
  • Agilent 86142B Optical Spectrum Analyser
  • Agilent 8164B Lighwave Measurement System with
    • 81633A Power Sensor
    • 81600B Tunable Laser
  • Nettest Tunable Lasers (1300nm +/-50nm and 1550nm +/-50nm)
  • TCR Measurement Station