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SPECIALTY SYSTEMS
We
provide a variety of systems for the deposition of
dielectric, optical, metallic, magnetic, alloy,
superconducting and semiconducting thin-films
using both Ion Beam Sputtering and Biased Target
Sputtering in R&D, pilot production and 24/7
manufacturing system configurations.
| Side Sputtering Magnetron/Ion
Beam Milling
4Wave's single wafer
load locked ion beam milling system can be
augmented with multiple DC and RF magnetron
cathodes. These systems provide the benefits of
excellent sputtering uniformity and film
properties. More...
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Load Lock
Ion Beam Delayering System
4Wave's
Ion Beam De-Layering System addresses the needs
of customers seeking a flexible, cost-effective
method for failure analysis of devices with sub
48nm line widths . More...
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