BIASED TARGET
DEPOSITION
4Wave is the pioneer in a new
deposition technology called Biased Target
Deposition. BTD is a hybrid between IBD and
conventional sputter deposition that combines
the best of each technique. BTD is uniquely
suited to demanding applications requiring
atomically engineered thin films and interfaces
as it offers a large range of process pressures,
control of adatom energies, and excellent
uniformity and repeatability. High performance
multilayer devices such as giant
magnetoresistive multilayers, optical
interference filters, and gate dielectric stacks
are particularly well suited to BTD. More...
IN-SITU PROCESS
MONITORING
Our team has
been at the forefront of in-situ process
monitoring in various ion beam and thin-film
processes. We are highly experienced in the
integration of these systems for the automatic
control of process gas mixing, etch endpoint
control, and deposition endpoint control.
More....
DYNAMIC PROCESS
COMPENSATION
4Wave is
developing unique, proprietary technologies to
actively monitor and control film thickness
uniformity across a wafer during a deposition or
etch process. Our patented technologies actively
adjust the process to correct for minute
differences in film thickness across a wafer. If
your application demands extremely tight control
of uniformity, please contact us for more
information. |
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ION BEAM
DEPOSITION
4Wave staff have designed more than
100 ion beam deposition systems, mostly as part
of their prior employment with Commonwealth
Scientific Corporation or Veeco Instruments.
This equipment has been installed worldwide in
applications ranging from university R&D to
large-scale device production. Ion beam
deposition is used broadly in R&D, the data
storage industry, and the optical components
industry. More...
ION BEAM ETCH
We have
designed and built ion beam etch equipment for
clients worldwide. Ion beam etching is used
mainly in R&D and device manufacturing of
data storage and optical components. More...
DIRECT ION BEAM
DEPOSITION
We have
extensive experience in Direct Ion Beam
Deposition systems. This equipment is mainly
used in applications requiring high performance,
thin diamond-like carbon coatings, particularly
in R&D, the data storage industry, the
ophthalmic coatings industry and the tool
coating industry. More...
ION-ASSITED
EVAPORATION
Ion-assisted
evaporation is used mainly to deposit multilayer
optical interference coatings for optical
filtering and antireflection. We have designed
such systems for R&D, the optical components
industry, and the ophthalmic coatings
industry. More...
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