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THIN FILM PROCESSING
4Wave offers metallic, nitride and dielectric thin films using
both Ion Beam and Biased Target deposition techniques. 4Wave can provide custom optical
interference filters coatings over the spectral range of 200nm to 2000nm for the use in a
variety of applications.
Process Equipment :
- Load Lock Ion Beam
Deposition System up to 150mm wafers (Metal or
Dielectric Films)
- Load Locked Biased
Target Deposition System up to 200mm wafers.
(Dielectric Films, Optical filters)
- Batch Biased Target Deposition System up to 100mm wafers. (Dielectric, metal,
co-deposition of up to 3 targets mixed with oxygen)
Metrology
Equpment:
PerkinElmer Lanbda 950 UV/VIS
Spectrometer (Transmition and Reflection)
Tencor P12 Profilometer and Stress
Measurement
Sentech SE850 UV/VIS Mapping
Elipsometer
Prometrix Resistivity Mapper
Macbeth TD929 Densitometer
Olympus BX60M Microscope with
Digital Camera
Agilent 86100A Wide Bandwidth
Osciloscope with 86105A 1000nm-1600nm
Agilent 86130A Error Perfromance
Analyser
Agilent 86142B Optical Spectrum
Analyser
Agilent 8164B Lighwave Measurement
System with
- 81633A Power Sensor
- 81600B Tunable Laser
Nettest
Tunable Lasers (1300nm +/-50nm and 1550nm +/-50nm)
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Blanket Films: |