Biased Target Ion Beam Deposition of GMR Multiayers

Abstract–  The low temperature reactive sputter deposition of amorphous rare earth substituted Bismuth Iron Garnet (BiDy)3 (FeAl)5 O12 using four simultaneous targets via a biased target deposition (BTD) system is reported for the first time. This method provides control over the material composition in a predictable way by controlling the individual target bias. The resultant films deposited on fused quartz substrates are highly uniform and on post annealing form high quality poly-crystalline garnet films.

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