A novel approach to fabricate extreme ultraviolet mask blanks based on BTD technique

Abstract–  Extensive optimization on the fabrication of Mo/Si multilayer system is carried out at 4Wave using bias target deposition technology. The process is being optimized including parameters such as uniformity, deposition parameters, reproducibility and layer composition. Reflectivity with values of around 69% are routinely achieved at normal incidence, demonstrating the capabilities of deposition process. Some evidence of sharpness to Mo/Si interface is given which is higher than that of others deposition techniques such as IBS, magnetron sputtering and e-beam.

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