1400Q312 LL Etch_edit

Product Description

The 4Wave Load Lock Etch System is a Flagship product addressing several significant markets. This system boasts high performance etching, critical thin film profile milling, glancing angle milling, etc.

Markets:

  • Semi-Conductor
  • Data Storage
  • MEMS
  • Wafer processing services

Applications:

  • Delayering (Failure Analysis)
  • Patterned Etch

Features:

  • 12cm & 22cm Gridded RF Ion Sources
  • 3 x 8″ target carousel
  • 300mm diameter process surface Deposition Uniformity < 3%
  • Repeatability <1%
  • Substrate plasma pre-cleaning
  • Single Platten Load Locked Stage
  • Multi substrate fixturing
  • > 500 hrs MTBF

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