Product Description

The Z-Flex system combines the best of Ion Beam Etching and Ion Beam Sputtering. This high value combination allows the customer to create thin film structures in common vacuum – A significant value proposition compared to the competition.

Markets Include:

  • Data Storage
  • Thin Film Magnetics
  • Semiconductor
  • Reactive Ion Assisted Etching
  • Etching and overcoat processing


  • Disk Slider fabrication
  • TMR and GMR applications
  • Semiconductor Failure Analysis
  • FINFET and advanced memory development

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